Control of nitrogen incorporation in ZnTe:N grown by molecular-beam epitaxy using Ar dilution in a N plasma source.

Autor: Duddles, N. J., Dhese, K. A., Devine, P., Ashenford, D. E., Scott, C. G., Nicholls, J. E., Lunn, B.
Předmět:
Zdroj: Journal of Applied Physics; 11/1/1994, Vol. 76 Issue 9, p5214, 4p, 2 Graphs
Abstrakt: Examines the control of nitrogen incorporation in ZnTe:N grown by molecular-beam epitaxy using argon dilution in a nitrogen plasma source. Trends in p-type conductivity; Description of the ZnTe layers; Relationship of the luminescence trends and the corresponding net hole concentrations as determined from C-V measurements.
Databáze: Complementary Index