| Autor: |
Hong, Q. Z., Barmak, K., Hong, Stella Q., Clevenger, L. A. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 10/15/1993, Vol. 74 Issue 8, p4958, 5p |
| Abstrakt: |
Presents a study that examined the crystallization of coevaporated, amorphous cobalt-silicon (CoSi) with and without ion irradiation. Importance of the compound in the shallow-junction formation; Discussion on the crystallization kinetics of amorphous CoSi; Effect of ion mass on the crystallization kinetics. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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