Low effective back-surface recombination velocity by boron implantation on 0.3-Ω-cm p-type silicon solar cells.

Autor: Verhoef, Leendert A., Zondervan, Albert, Lindholm, Fredrik A., Spitzer, Mark B., Keavney, Christopher J.
Předmět:
Zdroj: Journal of Applied Physics; 5/1/1988, Vol. 63 Issue 9, p4683, 5p
Abstrakt: Presents information on a study which measured a low effective back-surface recombination velocity on boron-implanted back-surface field silicon solar cells. Mechanisms which cause the observation of a larger S in the thin ion-implanted cells than in the thick ion-implanted cells; Description of the solar cell fabrication; Characterization of the cells; Discussion on the possible origin for the low surface recombination velocity observed on the thick cells.
Databáze: Complementary Index