| Autor: |
Chu, T. L., Chu, Shirley S., Ang, S. T., Lo, D. H., Duong, A., Hwang, C. G. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 2/15/1986, Vol. 59 Issue 4, p1319, 4p, 3 Diagrams, 4 Graphs |
| Abstrakt: |
Presents information on a study which described the use of thermal deposition of silicon[sub2]hydrogen[sub6] in a hydrogen or helium flow for the deposition of alpha-silicon:hydrogen films on Corning 7059 glass substrates. Deposition of the films; Electrical conductivity of the films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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