Autor:	Tanaka, K., Nakai, K., Aoki, O., Sugawara, M., Wakao, K., Yamakoshi, S.
Předmět:	IRON SEMICONDUCTOR doping EPITAXY VAPOR-plating
Zdroj:	Journal of Applied Physics; 5/1/1987, Vol. 61 Issue 9, p4698, 3p, 1 Diagram, 1 Graph
Abstrakt:	Investigates the iron doping by chloride vapor-phase epitaxy (VPE) to obtain semi-insulating (SI) InP layers. Resistivity of the SI-InP layer; Schematic configuration of the chloride VPE apparatus for the iron doping; Procedure of iron doping.
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu