Effect of a-SiNx:H composition on band bending near the interface of a-Si:H/a-SiNx:H layered structures.

Autor: Hiranaka, Kouichi, Yoshimura, Tetsuzo, Yamaguchi, Tadahisa, Yanagisawa, Shintaro
Předmět:
Zdroj: Journal of Applied Physics; 12/15/1986, Vol. 60 Issue 12, p4204, 5p, 7 Graphs
Abstrakt: Presents a study which investigated the effect of band bending near the interface of hydrogenated amorphous silicon/hydrogenated amorphous SiN[subx] layered structures. Experimental details; Results and discussion; Conclusion.
Databáze: Complementary Index