SiO2-Si interface formation by catalytic oxidation using alkali metals and removal of the catalyst species.
| Autor: | Soukiassian, P., Gentle, T. M., Bakshi, M. H., Hurych, Z. |
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| Zdroj: | Journal of Applied Physics; 12/15/1986, Vol. 60 Issue 12, p4339, 3p, 3 Graphs |
| Abstrakt: | Presents a study which examined the catalytic action of adsorbed cesium or sodium on the oxidation of silicon by core-level photoemission. Use of synchrotron radiation; Utilization of moderate thermal annealing; Conclusion. |
| Databáze: | Complementary Index |
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