| Autor: |
Raaijmakers, Ivo J. M. M., Reader, Alec H., Oosting, Piet H. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 4/15/1988, Vol. 63 Issue 8, p2790, 6p, 2 Black and White Photographs, 1 Chart, 4 Graphs |
| Abstrakt: |
Investigates the initial reaction in amorphous Si-Ti-amorphous Si trilayers using Auger electron spectroscopy, transmission electron microscopy and x-ray diffraction. Examination of the growth of an amorphous Ti-Si-phase in thick layers; Growth kinetics and composition of the amorphous silicide. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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