Effect of rf power on remote-plasma deposited SiO2 films.
| Autor: | Hattangady, S. V., Alley, R. G., Fountain, G. G., Markunas, R. J., Lucovsky, G., Temple, D. |
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| Zdroj: | Journal of Applied Physics; 6/1/1993, Vol. 73 Issue 11, p7635, 8p, 1 Chart, 6 Graphs |
| Abstrakt: | Studies the effect of radio frequency power on remote-plasma deposited SiO[sub2] films. Details on the experiment; Results of the study; Discussion of findings. |
| Databáze: | Complementary Index |
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