Low-temperature beam-induced deposition of thin tin films.
| Autor: | Funsten, H. O., Boring, J. W., Johnson, R. E., Brown, W. L. |
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| Zdroj: | Journal of Applied Physics; 2/1/1992, Vol. 71 Issue 3, p1475, 10p, 1 Diagram, 2 Charts, 7 Graphs |
| Abstrakt: | Presents a study that investigated low-temperature beam-induced deposition of thin tin films. Description of the experimental apparatus; TMT results; Information on the model of low-temperature beam-induced deposition. |
| Databáze: | Complementary Index |
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