Excimer laser-induced deposition of silicon nitride thin films.

Autor: Jasinski, J. M., Meyerson, B. S., Nguyen, T. N.
Předmět:
Zdroj: Journal of Applied Physics; 1/1/1987, Vol. 61 Issue 1, p431, 3p
Abstrakt: Examines the deposition of silicon nitride thin films using excimer laser photolysis of ammonia/silane or ammonia/disilane mixtures. Description of three photochemical deposition techniques considered in the analysis; Electrical characteristics of lamp deposited films; Details of the deposition apparatus used in the study.
Databáze: Complementary Index