A study of strain in thin epitaxial films of yttrium silicide on Si(111).
| Autor: | Siegal, Michelle F., Martínez-Miranda, L. J., Santiago-Avilés, J. J., Graham, W. R., Siegal, M. P. |
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| Zdroj: | Journal of Applied Physics; 2/1/1994, Vol. 75 Issue 3, p1517, 4p, 1 Chart, 5 Graphs |
| Abstrakt: | Presents a study that discussed the results of an x-ray diffraction analysis of epitaxial yttrium silicide films grown on silicon(111). Details of the experiment; Results; Discussion. |
| Databáze: | Complementary Index |
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