Furnace formation of silicon oxynitride thin dielectrics in nitrous oxide (N2O): The role of nitric oxide (NO).
| Autor: | Tobin, Philip J., Okada, Yoshio, Ajuria, Sergio A., Lakhotia, Vikas, Feil, William A., Hedge, Rama I. |
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| Zdroj: | Journal of Applied Physics; 2/1/1994, Vol. 75 Issue 3, p1811, 7p, 13 Graphs |
| Abstrakt: | Presents a study which examined the growth kinetics of the nitrous oxide furnace oxynitridation process. Experimental details; Results and discussion; Conclusions. |
| Databáze: | Complementary Index |
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