Evaluation of silicon films as a diffusion mask and encapsulant for InP and GaAs.
| Autor: | Chin, A. K., Camlibel, I., Marchut, L., Singh, S., Van Uitert, L. G., Zydzik, G. J. |
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| Zdroj: | Journal of Applied Physics; 11/1/1985, Vol. 58 Issue 9, p3630, 4p |
| Abstrakt: | Presents information on a study that determined that silicon films have nearly ideal properties for use as a diffusion mask and encapsulation coating for InP and GaAs. Research methodology; Results and discussion. |
| Databáze: | Complementary Index |
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