| Autor: |
Davis, G. M., Gower, M. C. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 3/1/1987, Vol. 61 Issue 5, p2090, 3p |
| Abstrakt: |
Presents information on a study which analyzed the time resolved transmission of P10, poly(methyl methacrylate), resist films during ablative photodecomposition of polymeric materials following exposure by the short-wavelength high-peak intensities available from excimer lasers. Effect of the increase of the laser fluence illuminating the resist film; Measurement of the number of pulses required to completely remove the resist; Observation of the increased scattering by the plume. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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