BF2 implanted polycrystalline silicon gates with and without CoSi2: Microstructure and work functions.
| Autor: | Lindenberger, S., Georgiou, G. E., Hillenius, S. J., Luftman, H., Baiocchi, F. A., Sheng, T. T., Field, R. L. |
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| Zdroj: | Journal of Applied Physics; 2/1/1991, Vol. 69 Issue 3, p1510, 8p, 16 Graphs |
| Abstrakt: | Analyzes the microstructure and metal-silicon work function of polycrystalline silicon films. Details on the experiment; Results of the study; Conclusion. |
| Databáze: | Complementary Index |
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