Growth of thin-film niobium and niobium oxide layers by molecular-beam epitaxy.

Autor: Petrucci, M., Pitt, C. W., Reynolds, S. R., Milledge, H. J., Mendelssohn, M. J., Dineen, C., Freeman, W. G.
Předmět:
Zdroj: Journal of Applied Physics; 2/1/1988, Vol. 63 Issue 3, p900, 10p, 3 Black and White Photographs, 3 Diagrams, 1 Chart
Abstrakt: Focuses on a study that described the growth of thin-film niobium and niobium oxide layers by molecular-beam epitaxy. Growth conditions; Discussion of niobium metal layers; Post-oxidation studies.
Databáze: Complementary Index