| Autor: |
Schwarz, C., Onda, N., Goncalves-Conto, S., Sirringhaus, H., von Känel, H., Pixley, R. E. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 12/1/1994, Vol. 76 Issue 11, p7256, 9p, 1 Diagram, 2 Charts, 7 Graphs |
| Abstrakt: |
Presents ion channeling studies of epitaxial iron and cobalt silicides on silicon. Description of the strain measurements performed; Factor to which the epitaxial stabilization of the cesium chloride phases is attributed; Technique used to determine the crystalline quality of thick bcc iron and silicide films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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