| Autor: |
Niwano, Michio, Katakura, Hitoshi, Takakuwa, Yuji, Miyamoto, Nobuo |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 12/1/1990, Vol. 68 Issue 11, p5576, 8p, 2 Diagrams, 1 Chart, 7 Graphs |
| Abstrakt: |
Focuses on a study that investigated the synchrotron-radiation-induced decomposition of thin native oxide films on silicon(100). Description of the samples used; Block diagram of the time-of-flight measurement system; Analysis of the silicon 2p core-level photoemission spectra. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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