| Autor: |
Blamire, M. G., Somekh, R. E., Barber, Z. H., Morris, G. W., Evetts, J. E. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 12/1/1988, Vol. 64 Issue 11, p6396, 10p, 1 Diagram, 2 Charts, 11 Graphs |
| Abstrakt: |
Presents a study that investigated the effect of microstructures of niobium/aluminum oxide/niobium tunnel junctions on the electronic properties of the tunnel junctions. Methodology; Analysis of the critical current density of the tunnel junctions; Examination of the non-uniformity of aluminum and the quality of the tunnel junctions. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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