Dislocation motion in GaAs/AlxGa1-xAs structures.

Autor: Kuesters, K.-H., De Cooman, B. C., Carter, C. B.
Předmět:
Zdroj: Journal of Applied Physics; 12/1/1985, Vol. 58 Issue 11, p4065, 9p, 6 Black and White Photographs, 7 Diagrams
Abstrakt: Presents a study that examined the dislocation motion in gallium arsenide/aluminum gallium arsenide semiconductors using transmission electron microscopy. Analysis of the dislocation configuration at scratches; Evaluation of the alignment of dislocations parallel to the heterojunction; Examination of the development of dislocation dipoles at the pinning points.
Databáze: Complementary Index