| Autor: |
Dobisz, E. A., Marrian, C. R. K., Colton, R. J. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 8/1/1991, Vol. 70 Issue 3, p1793, 7p |
| Abstrakt: |
Presents information on a study which examined the exposure behavior and the resolution that can be obtained by a poly-[5,7-(bis-1,12-n-butylcarboxy-methylene-urethane) dodecadiyne] (P4BCMU) resist system. Definition of the lithographic patterns; Pixel exposure results; Line exposure results; Discussion of electron scattering processes. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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