| Autor: |
Richards, Albert D., Thompson, Brian E., Allen, Kenneth D., Sawin, Herbert H. |
| Předmět: |
|
| Zdroj: |
Journal of Applied Physics; 8/1/1987, Vol. 62 Issue 3, p792, 7p |
| Abstrakt: |
Presents a study that measured the atomic chlorine concentration in chlorine (Cl)[sub2] and CF[sub3]Cl plasmas using both infrared absorption spectroscopy and optical emission actinometry. Reason why free radical concentration measurements made by direct monitoring of plasma emission intensity can give misleading results; Validity of actinometric techniques for fluorine atom detection; Correlation of Cl with the etching rate of heavily P-doped polysilicon. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
