Behavior of SiNx films as masks for Zn diffusion.
| Autor: | Zou, W. X., Vawter, G. A., Merz, J. L., Coldren, L. A. |
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| Zdroj: | Journal of Applied Physics; 8/1/1987, Vol. 62 Issue 3, p828, 4p |
| Abstrakt: | Investigates the behavior of silicon nitride thin films as masks of zinc diffusion. Applications of the selective zinc diffusion into III-V compound semiconductors; Details on the experiment; Discussion on the results of the study. |
| Databáze: | Complementary Index |
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