| Autor: |
Meeks, E., Cappelli, M. A. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 4/1/1993, Vol. 73 Issue 7, p3172, 11p, 1 Diagram, 1 Chart, 6 Graphs |
| Abstrakt: |
Describes a continuum model of a weakly ionized plasma in stagnation flow against an electrically biased surface. Features of plasma analyses; Details of several equations used for a weakly ionized, continuum plasma in stagnation-point flow against an electrically biased substrate; Description of the bulk fluid motion with nonuniform temperature and pressure; Information on the steady-state equation. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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