High quality In0.15Ga0.85As/AlxGa1-xAs strained multi quantum wells grown by metalorganic vapor phase epitaxy.

Autor: Buydens, Luc, Demeester, Piet, Yu, ZongQiang, Van Daele, Peter
Předmět:
Zdroj: Journal of Applied Physics; 4/1/1992, Vol. 71 Issue 7, p3249, 7p, 1 Diagram, 7 Graphs
Abstrakt: Presents information on a study that investigated the growth of In[sub0.15]Ga[sub0.85]As/Al[subx]Ga[sub1 x] strained layer multi quantum wells with the metalorganic vapor phase epitaxy technique. Experimental procedure; Results and discussion; Conclusion.
Databáze: Complementary Index