Instabilities in the resistivity of intrinsic polysilicon resistors during hydrogenation: Role of sodium and cooling kinetics.

Autor: Moore, Chad B., Ast, Dieter G.
Předmět:
Zdroj: Journal of Applied Physics; 9/15/1994, Vol. 76 Issue 6, p3579, 4p
Abstrakt: Examines the influence of the hydrogenation procedure on the occasional collapse of the resistivity of intrinsic polysilicon during hydrogenation. Polysilicon base materials used; Results; Data on sodium's influence on the resistivity after consecutive surface treatments.
Databáze: Complementary Index