Growth of uniform epitaxial CoSi2 films on Si(111).
| Autor: | Fischer, A. E. M. J., Slijkerman, W. F. J., Nakagawa, K., Smith, R. J., van der Veen, J. F., Bulle-Lieuwma, C. W. T. |
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| Zdroj: | Journal of Applied Physics; 9/15/1988, Vol. 64 Issue 6, p3005, 9p, 2 Black and White Photographs, 2 Diagrams, 7 Graphs |
| Abstrakt: | Analyzes the morphology of CoSi[sub2] films on silicon (111). Details on the experiment; Characterization of deposited layers; Possible causes of a change in morphology. |
| Databáze: | Complementary Index |
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