The thin-film reaction between Ti and thermally grown SiO2.

Autor: Barbour, J. C., Fischer, A. E. M. J., van der Veen, J. F.
Předmět:
Zdroj: Journal of Applied Physics; 9/15/1987, Vol. 62 Issue 6, p2582, 3p
Abstrakt: Provides information on a study which examined the reaction between a thin titanium film and a thermally grown silicon oxide substrate using medium-energy ion scattering. Methods; Results; Discussion.
Databáze: Complementary Index