Photoemission measurement of equilibrium segregation at GeSi surfaces.
| Autor: | Rowe, J. E., Riffe, D. M., Wertheim, G. K., Bean, J. C. |
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| Zdroj: | Journal of Applied Physics; 10/15/1994, Vol. 76 Issue 8, p4915, 3p, 2 Graphs |
| Abstrakt: | Presents information on a study that demonstrated the segregation of germanium to the surface of the equiatomic germanium-silicon alloy. Research method; Results and discussion on the study. |
| Databáze: | Complementary Index |
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