| Autor: |
Tait, R. N., Dew, S. K., Smy, T., Brett, M. J. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 10/15/1991, Vol. 70 Issue 8, p4295, 6p, 7 Black and White Photographs, 1 Diagram, 4 Graphs |
| Abstrakt: |
Deals with a study which detailed the measurement of density and resistivity of sputtered tungsten films as a function of angle-of-vapor incidence. Step taken to confirm density predictions; Applications of the results of the measurements; Motive for etching films deposited over vias. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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