Optical properties and microstructure of reactively sputtered indium nitride thin films.

Autor: Sullivan, Brian T., Parsons, R. R., Westra, K. L., Brett, M. J.
Předmět:
Zdroj: Journal of Applied Physics; 10/15/1988, Vol. 64 Issue 8, p4144, 6p
Abstrakt: Presents information on a study which measured the optical properties of reactively sputtered indium nitride (InN) thin films in the spectral region using spectroscopic ellipsometry. Construction of the direct current planar magnetron sputtering system; Microstructural analysis carried out to determine if film microstructure could be used to interpret the ellipsometry data; Results of x-ray diffraction studies of the InN films.
Databáze: Complementary Index