Autor: |
Timans, P. J. |
Předmět: |
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Zdroj: |
Journal of Applied Physics; 11/15/1993, Vol. 74 Issue 10, p6353, 12p, 16 Graphs |
Abstrakt: |
Presents a study which experimentally determined the temperature dependences of the spectral and total hemispherical emissivities of silicon by using a technique combining isothermal electron beam heating with in situ optical measurements. Discussion on the development of rapid thermal processing; Details of an experiment on silicon; Description of the reflection spectra of the silicon samples. |
Databáze: |
Complementary Index |
Externí odkaz: |
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