Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond.

Autor: Weiser, Paul S., Prawer, Steven, Hoffman, Alon, Manory, Rafael R., Paterson, Peter J. K., Stuart, Sue-Anne
Předmět:
Zdroj: Journal of Applied Physics; 11/15/1992, Vol. 72 Issue 10, p4643, 5p
Abstrakt: Investigates the effectiveness of thin films of thin titanium nitride (TiN) as barriers to carbon diffusion during chemical vapor deposition of diamond onto iron substrates. Factors affecting diamond growth on iron; Reason for the selection of TiN in the study; Effect of sputtered iron and carbon in TiN on diamond nucleation.
Databáze: Complementary Index