Autor: |
Cheng, S-C. N., Kryder, M. H. |
Předmět: |
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Zdroj: |
Journal of Applied Physics; 11/15/1991, Vol. 70 Issue 10, p5526, 7p, 2 Charts, 11 Graphs |
Abstrakt: |
Investigates the thermal stability of anisotropy in TbFe films prepared by dc-magnetron sputtering. Factor important in the determination of the thermal stability of perpendicular anisotropy in TbFe films; Explanation for the improvement in the thermal stability of perpendicular anisotropy during an increase in argon sputtering pressure; Effect of stress on thermal stability of anisotropy. |
Databáze: |
Complementary Index |
Externí odkaz: |
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