Thermal stability of anisotropy in TbFe films prepared by dc-magnetron sputtering.

Autor: Cheng, S-C. N., Kryder, M. H.
Předmět:
Zdroj: Journal of Applied Physics; 11/15/1991, Vol. 70 Issue 10, p5526, 7p, 2 Charts, 11 Graphs
Abstrakt: Investigates the thermal stability of anisotropy in TbFe films prepared by dc-magnetron sputtering. Factor important in the determination of the thermal stability of perpendicular anisotropy in TbFe films; Explanation for the improvement in the thermal stability of perpendicular anisotropy during an increase in argon sputtering pressure; Effect of stress on thermal stability of anisotropy.
Databáze: Complementary Index