Photoresist stripping in afterglow of Ar-O2 microwave plasma.
| Autor: | Metselaar, J. W., Kuznetsov, V. I., Zhidkov, A. G. |
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| Zdroj: | Journal of Applied Physics; 5/15/1994, Vol. 75 Issue 10, p4910, 7p, 3 Diagrams, 1 Chart, 3 Graphs |
| Abstrakt: | Presents a study in which the experimental investigation of the photoresist etching rate in the afterglow of argon-oxygen microwave plasma was performed. Introduction to photoresist; Experimental setup; Results and discussion. |
| Databáze: | Complementary Index |
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