| Autor: |
Shearwood, C., Blundell, S. J., Baird, M. J., Bland, J. A. C., Gester, M., Ahmed, H., Hughes, H. P. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 5/15/1994, Vol. 75 Issue 10, p5249, 8p, 6 Diagrams, 3 Graphs |
| Abstrakt: |
Presents a study which developed a technique for engineering micron and submicron scale structures from magnetic films of transition metals using a combination of electron- and ion-beam lithography enabling high-quality arrays of submicron magnetic iron wires to be fabricated. Background on high-quality ultrathin magnetic films; Experimental details; Magnetization and magnetoresistance results. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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