Crystallization of amorphous Ti-Si alloy thin films: Microstructure and resistivity.

Autor:	Raaijmakers, Ivo J. M. M., van Ommen, Alfred H., Reader, Alec H.
Předmět:	CRYSTALLIZATION THIN films TITANIUM SILICON
Zdroj:	Journal of Applied Physics; 5/15/1989, Vol. 65 Issue 10, p3896, 11p, 2 Black and White Photographs, 8 Graphs
Abstrakt:	Presents a study which crystallized cosputtered amorphous thin films consisting of titanium and silicon. Experiment; Results; Conclusion.
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu