| Autor: |
Hager, Harold E., Escobar, Glenn A., Verge, Peter D. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 5/15/1986, Vol. 59 Issue 10, p3328, 4p |
| Abstrakt: |
Focuses on the unique resist characterization capabilities resulting from the use of a piezoelectric crystal as the substrate for a photoresist film. Overview of a systematic specification of an optimum photoresist process; Information on Fourier transform infrared spectrometers; Temporal variation of oscillation amplitude versus frequency for an illuminated well-dried photoresist film. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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