Evaluation of the Coulomb energy for single-electron interface trapping in sub-μm metal-oxide-semiconductor field-effect transistors.

Autor: Mueller, H. H., Wörle, D., Schulz, M.
Předmět:
Zdroj: Journal of Applied Physics; 3/15/1994, Vol. 75 Issue 6, p2970, 10p, 6 Diagrams, 1 Chart, 3 Graphs
Abstrakt: Provides information on a study which measured the capture and emission time constants for a set of individual interface traps in different metal-oxide-semiconductor field-effect transistors (MOSFET) by random telegraph signals. Coulomb energy induced by the transfer of a single electron into an interface trap; Details of the experiments; Results and discussion.
Databáze: Complementary Index