Mechanism of arsenic incorporation and electrical properties in CdTe layers grown by metalorganic vapor phase epitaxy.

Autor: Ekawa, Mitsuru, Yasuda, Kazuhito, Ferid, Touati, Saji, Manabu, Tanaka, Akikazu
Předmět:
Zdroj: Journal of Applied Physics; 3/15/1992, Vol. 71 Issue 6, p2669, 6p, 8 Graphs
Abstrakt: Examines the arsenic doping mechanism in cadmium telluride layers grown on gallium arsenide by atmospheric pressure metalorganic vapor phase epitaxy. Ionization energy for the arsenic acceptor; Determination of the background in undoped layers; Cadmium telluride growth kinetics.
Databáze: Complementary Index