| Autor: |
Yu, Ming L., Vitkavage, D. J., Meyerson, B. S. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 6/15/1986, Vol. 59 Issue 12, p4032, 6p, 7 Graphs |
| Abstrakt: |
Presents information on a study which examined the reaction of phosphine PH[sub3] and diborane B[sub2]H[sub6] on silicon(100) surfaces by surface analytical techniques in relation to the in situ doping process in the chemical vapor deposition of silicon. Factors that contributed to the binding energies of various core levels as fingerprints for the chemical state of the atoms; Experimental details; Results and discussion; Conclusions. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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