| Autor: |
Budhani, R. C., O’Brien, B. P., Doerr, H. J., Deshpandey, C. V., Bunshah, R. F. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 6/15/1985, Vol. 57 Issue 12, p5477, 6p |
| Abstrakt: |
Reports on the preparation of platinum-silicon (Pt/Si) alloys over a wide composition range by reactive magnetron sputtering of platinum in a SiH[sub4] plasma. Technique used to measure the stoichiometry of the alloy deposits; Variation of Si/Pt ratio in the film as a function of flow rate of silane for cathode voltages; X-ray diffraction patterns of the films deposited at room temperature containing several amounts of Pt. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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