The dependence of contamination particle traps on wafer material and topography.

Autor: Geha, Sam G., Carlile, Robert N., O’Hanlon, John F., Selwyn, Gary S.
Předmět:
Zdroj: Journal of Applied Physics; 7/15/1992, Vol. 72 Issue 2, p374, 10p
Abstrakt: Presents information on a study which utilized a tuned Langmuir probe to measure the plasma potential of regions occupied by contamination particles. Role of negative charge on plasma particles; Experimental apparatus; Visual observation of particles using the helium-neon laser system; Conditions required for the traps to attract and maintain negatively charged particles.
Databáze: Complementary Index