Fabrication of nanostructures in strained InGaAs/GaAs quantum wells by focused-ion-beam implantation.

Autor: Allard, L. B., Aers, G. C., Charbonneau, S., Jackman, T. E., Williams, R. L., Templeton, I. M., Buchanan, M., Stevanovic, D., Almeida, F. J. D.
Předmět:
Zdroj: Journal of Applied Physics; 7/15/1992, Vol. 72 Issue 2, p422, 7p
Abstrakt: Presents information on a study which utilized low-temperature photoluminescence (PL) spectroscopy to estimate the compositional disordering induced by gallium focused-ion-beam implantation in a series of strained quantum wells. Patterns of implantation made for each of the five implant doses; Calculation of interdiffusion lengths; Examination of the broad-area-implanted regions.
Databáze: Complementary Index