| Autor: |
Slijkerman, W. F. J., Fischer, A. E. M. J., van der Veen, J. F., Ohdomari, I., Yoshida, S., Misawa, S. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 7/15/1989, Vol. 66 Issue 2, p666, 8p |
| Abstrakt: |
Presents a study which focused on the reactivity and morphology of ultrathin Ni films deposited on β-SiC in order to determined the initial stages of silicide formation on an atomic scale. Analysis of the composition and morphology of the deposited and reacted films; Determination of the energy of the elastically backscattered ions; Presentation of ion-scattering results. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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