| Autor: |
Jesser, W. A., van der Merwe, J. H. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 1/15/1994, Vol. 75 Issue 2, p872, 7p, 2 Diagrams |
| Abstrakt: |
Assesses the relative contributions of glide and climb processes in the relaxation of misfit strain in heteroepitaxial layers. Two problems of efficient misfit accommodation that arise when threading dislocations glide to produce misfit dislocations; Misfit accommodation model; Differences between the dislocation velocities in thin films and those in bulk material. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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