| Autor: |
Tsai, T. E., Friebele, E. J., Griscom, D. L., Pannhorst, W. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 1/15/1989, Vol. 65 Issue 2, p507, 8p, 9 Black and White Photographs, 2 Charts, 3 Graphs |
| Abstrakt: |
Characterizes the radiation-induced defect centers in low-thermal-expansion glass ceramics using electron spin resonance. Devices in which low-thermal-expansion glass ceramics are used; Analysis and interpretation of the characterization of radiation-induced defect centers; Effect of crystallization on the radiation-induced centers. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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