Tantalum silicide Schottky contacts to GaAs.

Autor: Lee, C. P., Liu, T. H., Lei, T. F., Wu, S. C.
Předmět:
Zdroj: Journal of Applied Physics; 1/15/1989, Vol. 65 Issue 2, p642, 4p, 8 Graphs
Abstrakt: Examines the tantalum silicide films with different silicon to tantalum ratios as Schottky contacts to gallium arsenide. Preparation of the films by coevaporation; Metallurgical properties of the film; Stability of the silicide-gallium arsenide interface.
Databáze: Complementary Index