| Autor: |
Miller, N. C., Zemon, S., Werber, G. P., Powazinik, W. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 1/15/1985, Vol. 57 Issue 2, p512, 4p, 2 Graphs |
| Abstrakt: |
Measures the composition of aluminum[subx] gallium[sub1-x] arsenic with improved accuracy by electron probe microanalysis using an aluminum-copper alloy standard rather than an elemental aluminum standard. Technique which can be employed to evaluate aluminum gallium arsenic wafers; Description of the aluminum gallium arsenic layers used; Information on the electron probe used for the measurement of film composition. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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